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14:25
ASML: Expects EUV lithography machine wafer output per hour to increase by 50% by 2030
Gelonghui, February 23rd|ASML stated that by increasing power, the power of the lithography machine's extreme ultraviolet (EUV) light source can be raised to 1000 watts. It is expected that by 2030, the hourly wafer output of EUV lithography machines can increase by 50%.
14:17
Report: ASML Unveils Breakthrough in EUV Light Source, Chip Production Expected to Increase by 50% by 2030
“This is not a gimmick, nor is it a trick that can only be demonstrated for a very short period of time,” said Michael Purvis, Chief Technology Officer of EUV Light Source at ASML. “This is a system that can stably generate 1,000 watts of power while meeting all the practical needs of our customers,” he added at the company’s facility near San Diego, California.
14:11
According to data from the Federal Reserve Bank of New York, the Secured Overnight Financing Rate (SOFR) was 3.66% on the previous trading day (February 20), compared to 3.67% the day before.
The effective federal funds rate for the previous trading day was reported at 3.64%, unchanged from the previous day at 3.64%.
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